EVAPORATION SOURCE AND VAPOR DEPOSITION APPARATUS

• Main Authors: SATO SATOSHI, KAZAMA YOSHIAKI
• Format: Patent
• Language: English; Korean
• Published: 05.07.2019
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The present invention provides an evaporation source and a deposition apparatus which can improve cooling efficiency. The evaporation source (10) comprises: a crucible (100) to accommodate a material of a substance deposited on a substrate; a heating body (200) installed to surround the crucible (100) to heat the crucible (100); and a reflector (300) installed to surround the heating body (200) to block heat. The evaporation source (10) further comprises: a coolant chamber (311) installed in a reflector body (310) to follow an inner wall of the reflector body (310), in which a coolant flows; and a liquid discharge pipe (340) arranged in the coolant chamber (311) to discharge a coolant from a lower portion of the coolant chamber (311). [과제] 냉각 효율을 높일 수 있는 증발원 및 증착 장치를 제공한다. [해결 수단] 기판에 증착시키는 물질의 재료를 수용하는 도가니(100)와, 도가니(100)를 둘러싸도록 설치되어, 도가니(100)를 가열하는 가열체(200)와, 가열체(200)를 둘러싸도록 설치되어, 열을 차단하는 리플렉터(300)를 구비하는 증발원(10)으로서, 리플렉터 본체(310)의 내부에 리플렉터 본체(310)의 내벽면을 따르도록 설치되고, 또한 냉각액이 흐르는 냉각액실(311)과, 냉각액실(311) 내에 구비되어, 냉각액을 냉각액실(311)의 하방으로부터 배출시키는 배액관(340)을 구비하는 것을 특징으로 한다.