구조물들의 마이크로리소그래픽 제작

• Main Authors: XU FRANK Y, YANG SHUQIANG, SINGH VIKRAMJIT, LUO KANG, MILLER MICHAEL NEVIN
• Format: Patent
• Language: Korean
• Published: 29.05.2019
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

본 발명은 기판 상에 형성된 임프린트 층들의 마이크로- 및 나노-패턴들 및 그런 층들을 형성하는 리소그래픽 방법들에 관한 것이다. 층들은 복수의 구조물들, 및 기판의 표면으로부터 구조물들의 베이스로 연장되는 잔류 층 두께(RLT)를 가진 잔류 층을 포함하고, 여기서 RLT는 미리정의된 패턴에 따라 기판의 표면에 걸쳐 가변한다. Micro- and nano-patterns in imprint layers formed on a substrate and lithographic methods for forming such layers. The layers include a plurality of structures, and a residual layer having a residual layer thickness (RLT) that extends from the surface of the substrate to a base of the structures, where the RLT varies across the surface of the substrate according to a predefined pattern.