Apparatus and method for inspecting multi-layer structure method for fabricating semiconductor device comprising the method

• Main Authors: KIM JUNG WON, RYU SUNG YOON, JUN CHUNG SAM, YANG YU SIN, KWAK HYUN SU
• Format: Patent
• Language: English; Korean
• Published: 17.05.2019
• Subjects: INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MEASURING; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; PHYSICS; TESTING

Provided are a device and a method to inspect a multilayer structure, capable of reliably inspecting a multilayer structure in a sample without damage to the sample. The inspecting device includes: an input part generating light and polarizing the light; a beam splitter splitting the light from the...