TOXIC GAS TREATING SYSTEM

The present invention relates to an integrated processing system for purifying and discharging harmful gas generated in a semiconductor manufacturing process, and more specifically, to an integrated processing system for harmful gas, which integrally has a scrubbing dust collection unit, an electros...

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Bibliographic Details
Main Authors NOH HAK JAE, YUN GEUM SOO, KIM HYUN HO
Format Patent
LanguageEnglish
Korean
Published 08.05.2019
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:The present invention relates to an integrated processing system for purifying and discharging harmful gas generated in a semiconductor manufacturing process, and more specifically, to an integrated processing system for harmful gas, which integrally has a scrubbing dust collection unit, an electrostatic precipitation unit and a catalyst reaction unit in a housing to be possible to process HF gas and HCI gas which are discharged acid gas, N_2O gas and nitrogen oxide which are greenhouse gas, and fine materials at the same time, and is possible to reduce energy through a heat exchanger. 본 발명은 반도체 제조 공정 시 발생되는 유해가스를 정화 처리하여 배출하기 위한 통합 처리 시스템에 관한 것으로서, 보다 상세하게는 하우징 내에 세정집진부, 전기집진부, 촉매반응부가 통합적으로 구비되어 배출되는 산가스인 HF가스와 HCl 가스, 온실가스인 NO가스 및 질소산화물과 미세물질을 동시에 처리가 가능하며, 열교환기를 통해 에너지를 절약할 수 있는 유해가스 통합 처리시스템에 관한 것이다.
Bibliography:Application Number: KR20170140818