WAFER POSITION INSPECTING APPARATUS

One embodiment of the present invention provides a water position inspecting apparatus, including: a chuck on which a wafer is mounted; a plurality of photographing units provided on an upper portion of the chuck and photographing an area around the chuck to generate an image; and a control unit ima...

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Bibliographic Details
Main Authors KUH BONG JIN, SHIN JOONG HAN, CHARNVANICHBORIKARN SUPAKIT, LEE JAE HEE
Format Patent
LanguageEnglish
Korean
Published 07.05.2019
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:One embodiment of the present invention provides a water position inspecting apparatus, including: a chuck on which a wafer is mounted; a plurality of photographing units provided on an upper portion of the chuck and photographing an area around the chuck to generate an image; and a control unit image-processing each image photographed by the plurality of photographing units to detect an edge of the wafer and determining that the wafer is normally arranged on the chuck if the edge of the wafer is detected from each image photographed by the plurality of photographing units. 본 발명의 일 실시예는 웨이퍼가 안착되는 척; 상기 척의 상부에 배치되고, 상기 척의 주변 영역을 촬영하여 이미지를 생성하는 복수의 촬영부; 및 상기 복수의 촬영부에서 촬영된 각각의 이미지를 화상처리하여 상기 웨이퍼의 엣지를 검출하고, 상기 복수의 촬영부에서 촬영된 각각의 이미지에서 상기 웨이퍼의 엣지가 검출되면 상기 척에 상기 웨이퍼가 정상 정렬된 것으로 판별하는 제어부;를 포함하는 웨이퍼 위치 검사 장치를 제공한다.
Bibliography:Application Number: KR20170139316