고체 표면의 개질 방법

• Main Authors: ZUILHOF JOHANNES TEUNIS, RIJO DA COSTA CARVALHO RUI PEDRO, SCHERES LUC MARIA WILHELMUS, KNOBEN WOUT, MEER VAN DER ADRIAAN MARTIN HUBERT HENRI
• Format: Patent
• Language: Korean
• Published: 24.04.2019
• Subjects: AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G; APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTROGRAPHY; GENERAL PROCESSES OF COMPOUNDING; GLASS; HOLOGRAPHY; JOINING GLASS TO GLASS OR OTHER MATERIALS; MATERIALS THEREFOR; METALLURGY; MINERAL OR SLAG WOOL; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS; SURFACE TREATMENT OF GLASS; THEIR PREPARATION OR CHEMICAL WORKING-UP; WORKING-UP

본 발명은 임의적으로 광 개시제의 존재하에서 200 내지 800nm 파장의 광으로 조사하면서 표면을 표면-개질 화합물과 접촉시키는 단계를 포함하는, 고체 물질의 표면을 개질하는 방법에 관한 것으로서, 이 때 a) 상기 표면은 Si-OH 기, C-OH 또는 에폭시기를 갖고, 상기 표면-개질 화합물은 하이드로실란이거나, b) 상기 표면은 O-Si-H 기를 갖고, 상기 표면-개질 화합물은 실란올 또는 알콜이다. A process for the modification of a surface of a solid material, including the step of contacting the surface with a surface-modifying compound under irradiation with light of a wavelength in the range of 200 to 800 nm optionally in the presence of a photoinitiator, wherein a) the surface has Si-OH groups, C-OH groups or epoxy groups and the surface-modifying compound is a hydrosilane, or b) the surface has O-Si-H groups and the surface-modifying compound is a silanol or an alcohol.