감광성 조성물, 경화막, 광학 필터, 적층체, 패턴 형성 방법, 고체 촬상 소자, 화상 표시 장치 및 적외선 센서

• Main Authors: TAKAHASHI KAZUTAKA, OKAWARA TAKAHIRO, MIYATA TETSUSHI
• Format: Patent
• Language: Korean
• Published: 29.03.2019
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

직사각형성이 양호하고, 가열 수축이 억제된 패턴을 갖는 경화막을 형성할 수 있는 감광성 조성물을 제공한다. 또, 상술한 감광성 조성물을 이용한 경화막, 광학 필터, 적층체, 패턴 형성 방법, 고체 촬상 소자, 화상 표시 장치 및 적외선 센서를 제공한다. 이 감광성 조성물은, 근적외선 흡수제와, 경화성 화합물과, 광개시제와, 자외선 흡수제를 포함하고, 자외선 흡수제는, 열중량 측정에 있어서, 150℃에 있어서의 질량 감소율이 5% 이하이며, 또한 220℃에 있어서의 질량 감소율이 40% 이상이다. A photosensitive composition with which a cured film that includes a pattern having excellent rectangularity and suppressed thermal shrinkage can be formed is provided. A cured film formed of the photosensitive composition, an optical filter, a laminate, a pattern forming method, a solid image pickup element, an image display device, and an infrared sensor are provided. The photosensitive composition includes a near infrared absorber, a curable compound, a photoinitiator, and an ultraviolet absorber, in which in thermogravimetry, the ultraviolet absorber has a mass loss percentage of 5% or lower at 150° C. and has a mass loss percentage of 40% or higher at 220° C.