ACID GENERATOR COMPOUNDS AND PHOTORESISTS COMPRISING SAME

• Main Authors: RACHFORD AARON A, JAIN VIPUL, LABEAUME PAUL J
• Format: Patent
• Language: English; Korean
• Published: 11.12.2018
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

Provided is an acid generator compound which is particularly useful as a photoresist composition components. The acid generator compound of the present invention comprises: 1) a cyclic sulfonium salt; and 2) a covalently bonded photoacid-labile group. In one aspect, a thioxanthone acid generator compound is particularly preferred, and for example, the acid generator compound comprises: (i) thioxanthone residues; and (ii) at least one covalently bonded acid labile group. 포토레지스트 조성물 성분으로 특히 유용한 산 발생제 화합물이 제공된다. 본 발명의 산 발생제 화합물은 1) 사이클릭 설포늄염과 2) 공유결합된 포토애시드-불안정성 그룹을 포함한다. 일 측면에서, 티오잔톤 산 발생제 화합물이 특히 바람직하며, 예를 들어 산 발생제 화합물은 (i) 티오잔톤 잔기; 및 (ii) 하나 이상의 공유결합된 산 불안정성 그룹을 포함한다.