NOVEL HALOGERMANIDES AND METHODS FOR THE PREPARATION THEREOF
The present invention relates to a novel halogermanide and a preparation method thereof, and more particularly, to a trichlorogermanide of chemical formula I, [R_4N]/[R_4P]Cl[GeCl_3]. In chemical formula I, R is Me, Et, iPr, nBu, and Ph. Accordingly, a Ge or Si-Ge compound prepared by the present in...
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Main Authors | , , |
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Format | Patent |
Language | English Korean |
Published |
11.12.2018
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Subjects | |
Online Access | Get full text |
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Summary: | The present invention relates to a novel halogermanide and a preparation method thereof, and more particularly, to a trichlorogermanide of chemical formula I, [R_4N]/[R_4P]Cl[GeCl_3]. In chemical formula I, R is Me, Et, iPr, nBu, and Ph. Accordingly, a Ge or Si-Ge compound prepared by the present invention can be served as a precursor for a material used for controlled deposition of a thin Si-Ge layer.
본 발명은 신규한 할로게르마나이드 및 그것의 제조 방법에 관한 것이다. |
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Bibliography: | Application Number: KR20180062255 |