NOVEL HALOGERMANIDES AND METHODS FOR THE PREPARATION THEREOF

The present invention relates to a novel halogermanide and a preparation method thereof, and more particularly, to a trichlorogermanide of chemical formula I, [R_4N]/[R_4P]Cl[GeCl_3]. In chemical formula I, R is Me, Et, iPr, nBu, and Ph. Accordingly, a Ge or Si-Ge compound prepared by the present in...

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Bibliographic Details
Main Authors TEICHMANN JULIAN, LERNER HANS WOLFRAM, WAGNER MATTHIAS
Format Patent
LanguageEnglish
Korean
Published 11.12.2018
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Summary:The present invention relates to a novel halogermanide and a preparation method thereof, and more particularly, to a trichlorogermanide of chemical formula I, [R_4N]/[R_4P]Cl[GeCl_3]. In chemical formula I, R is Me, Et, iPr, nBu, and Ph. Accordingly, a Ge or Si-Ge compound prepared by the present invention can be served as a precursor for a material used for controlled deposition of a thin Si-Ge layer. 본 발명은 신규한 할로게르마나이드 및 그것의 제조 방법에 관한 것이다.
Bibliography:Application Number: KR20180062255