METHODS AND APPARATUS FOR DEPOSITION PROCESSES

• Main Authors: YE ZHIYUAN, CHU SCHUBERT S, MYO NYI O, KIM YIHWAN, BAUTISTA KEVIN
• Format: Patent
• Language: English; Korean
• Published: 05.12.2018
• Subjects: AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; CRYSTAL GROWTH; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE; REFINING BY ZONE-MELTING OF MATERIAL; SEMICONDUCTOR DEVICES; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE; SINGLE-CRYSTAL-GROWTH; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL

증착 프로세스들을 위한 방법들 및 장치가 본원에서 제공된다. 일부 실시예들에서, 장치는, 상부 표면 내에 배치된 포켓을 가지며, 그리고 상기 상부 표면 내에 형성되어 상기 포켓을 둘러싸며 기판을 상부에서 지지하도록 구성되는 립을 가지는, 서셉터 플레이트; 및 기판이 상기 립 상에 배치될 때 상기 기판의 후방측면과 상기 포켓 사이에 포획되는 가스들을 배기하기 위해서 상기 포켓으로부터 상기 서셉터 플레이트의 상부 표면까지 연장하는 복수의 벤트들을 포함하는 기판 지지부를 포함할 수 있을 것이다. 기판상에 층을 증착하기 위한 본원 발명에 따른 장치를 이용하는 방법들이 또한 개시된다. Methods and apparatus for deposition processes are provided herein. In some embodiments, an apparatus may include a substrate support including a susceptor plate having a pocket disposed in an upper surface of the susceptor plate and having a lip formed in the upper surface and circumscribing the pocket, the lip configured to support a substrate on the lip; and a plurality of vents extending from the pocket to the upper surface of the susceptor plate to exhaust gases trapped between the backside of the substrate and the pocket when a substrate is disposed on the lip. Methods of utilizing the inventive apparatus for depositing a layer on a substrate are also disclosed.