TARGET AND METHOD FOR MANUFACTURING THE SAME

• Main Author: KIM, KYEONG SIK
• Format: Patent
• Language: English; Korean
• Published: 21.11.2018
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The present invention relates to a target material for a ceramic sputtering which is bonded to a metal backing plate via a bonding reagent. The present invention is the ceramic target material formed with a structure pattern in a continuous combination of a concave part and a convex part at one side surface of a body, comprising: the concave part formed in a lattice shape by a gap of 5-20mm such that the structure pattern and an inclined plane opposed thereto are symmetrical to each other; and a structure formed to be embossed so as to be surrounded by the concave part while the width of the convex part is 1-10mm. 본 발명은 금속 재질의 백킹 플레이트(Backing Plate)에 본딩(Bonding)제를 통해 접합되는 세라믹(Ceramic) 재질의 스퍼터링(Sputtering)용 타켓재(Target Material)에 관한 것이다. 이와 같은 본 발명은 바디(Body)의 일측 표면에 요(凹)부와 철(凸)부의 연속적인 조합으로 구조물 패턴(Pattern)이 형성된 세라믹 재질의 타켓재에 있어서, 상기 구조물 패턴은 마주보는 빗면이 서로 대칭되게 5 내지 20mm의 간격으로 격자(格子) 형태로 형성된 요부; 상기 요부에 둘러싸여 지도록 철부의 폭이 1 내지 10mm가 되도록 양각으로 형성된 구조물을 포함한 것을 그 특징으로 한다.