Process for removal of bromine iodine bromine- and/or iodine-containing compounds from chlorosilanes
The present invention relates to a method for removing bromine, bromine- and/or iodine-containing silicon compounds from a composition of chlorosilanes containing bromine, bromine- and/or iodine-containing silicon compounds, wherein the composition is applied to nonthermal plasma and subsequently th...
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Main Authors | , |
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Format | Patent |
Language | English Korean |
Published |
15.10.2018
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Subjects | |
Online Access | Get full text |
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Summary: | The present invention relates to a method for removing bromine, bromine- and/or iodine-containing silicon compounds from a composition of chlorosilanes containing bromine, bromine- and/or iodine-containing silicon compounds, wherein the composition is applied to nonthermal plasma and subsequently the chlorosilanes can be separated from existing bromine- and/or iodine-containing compounds by distillation.
본 발명은 브로민, 브로민- 및/또는 아이오딘-함유 규소 화합물을 함유하는 클로로실란의 조성물로부터 브로민, 브로민- 및/또는 아이오딘-함유 규소 화합물의 제거를 위한 방법으로서, 여기서 조성물은 비열적 플라즈마에 적용되고, 후속적으로 클로로실란은 존재하는 브로민- 및/또는 아이오딘-함유 화합물로부터 증류에 의해 분리될 수 있는 것인 방법에 관한 것이다. |
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Bibliography: | Application Number: KR20180038935 |