COMPOSITION FOR HARD MASK

A composition for a hard mask of the present invention comprises a carbazole unit, a biphenyl unit, and a polycondensate comprising a linker unit derived from at least one of formaldehyde or a synthetic equivalent thereof, or a compound represented by chemical formula 3, and a solvent. The hard mask...

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Bibliographic Details
Main Authors CHOI, HAN YOUNG, YANG, DON SIK
Format Patent
LanguageEnglish
Korean
Published 08.10.2018
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A composition for a hard mask of the present invention comprises a carbazole unit, a biphenyl unit, and a polycondensate comprising a linker unit derived from at least one of formaldehyde or a synthetic equivalent thereof, or a compound represented by chemical formula 3, and a solvent. The hard mask having improved etching resistance, solubility and flatness at the same time can be formed from the composition for the hard mask. 본 발명의 하드마스크용 조성물은 카바졸 유닛, 비페닐 유닛, 및 포름알데히드 혹은 이의 합성 등가체, 또는 화학식 3으로 표시되는 화합물 중 적어도 하나로부터 유래된 링커 유닛을 포함하는 중축합체, 및 용매를 포함한다. 하드마스크용 조성물로부터 내에칭성, 용해성 및 평탄성이 동시에 향상된 하드마스크가 형성될 수 있다.
Bibliography:Application Number: KR20170038677