Cleaning composition

The present invention provides a cleaning composition comprising a compound represented by chemical formula 1 as a solvent. In chemical formula 1, R1 is a linear or branched alkyl group having 3 to 6 carbon atoms, and n is an integer of 0 to 3. The cleaning composition of the present invention is ex...

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Bibliographic Details
Main Authors YOO, IN KEE, KWON, HYUK SU
Format Patent
LanguageEnglish
Korean
Published 19.09.2018
Subjects
ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES
CANDLES
CHEMISTRY
DETERGENT COMPOSITIONS
DETERGENTS
FATTY ACIDS THEREFROM
METALLURGY
RECOVERY OF GLYCEROL
RESIN SOAPS
SOAP OR SOAP-MAKING
USE OF SINGLE SUBSTANCES AS DETERGENTS
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Summary:The present invention provides a cleaning composition comprising a compound represented by chemical formula 1 as a solvent. In chemical formula 1, R1 is a linear or branched alkyl group having 3 to 6 carbon atoms, and n is an integer of 0 to 3. The cleaning composition of the present invention is excellent in decontamination ability, and the solvent included in the cleaning composition of the present invention has a low hydrolysis rate and excellent stability of the product at high pH. 본 발명은 하기 화학식 1의 화합물을 용제로 포함하는, 세정 조성물을 제공한다. <화학식 1>여기서, 상기 R은 탄소수 3 내지 6의 직쇄 또는 측쇄 알킬 그룹이고, 상기 n은 0 내지 3의 정수임. 본 발명의 본 발명의 세정 조성물은 오염 제거 능력이 탁월하며, 본 발명의 세정 조성물에 포함되는 용제는 가수분해 속도가 느리고, 높은 pH에서도 제품의 안정성이 우수하다.
Bibliography:Application Number: KR20170030743