SUBSTRACT CLEANING APPARATUS FOR REMOVAL PHOTORESIST AND METHOD USING THE SAME

The present invention relates to a substrate cleaning apparatus and a method for removing a photoresist film thereof, and more specifically, to a substrate cleaning apparatus for improving substrate processing cleaning efficiency by performing a cleaning process of removing a photoresist film using...

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Bibliographic Details
Main Authors KIM, GYOO DONG, KIM, SHEUNG KI, CHOI, DAI KYU
Format Patent
LanguageEnglish
Korean
Published 05.09.2018
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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