가스를 가열하기 위한 열교환기 및 이 열교환기의 사용

• Main Authors: STEPHAN OSKAR, SCHNEIDER KARL FRIEDRICH, WEISMANTEL MATTHIAS
• Format: Patent
• Language: Korean
• Published: 31.08.2018
• Subjects: BLASTING; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OFGENERAL APPLICATION; DIFFUSION TREATMENT OF METALLIC MATERIAL; DRYING; DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM; HEAT EXCHANGE IN GENERAL; HEATING; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; LIGHTING; MECHANICAL ENGINEERING; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; WEAPONS

본 발명은 150 내지 400℃ 범위의 온도로 가스를 가열하기 위한 열교환기에 관한 것으로, 상기 가스는 간접 열 전달에 의해 가열되고, 상기 가스와 접촉하게 되는 상기 열교환기의 벽들의 모든 표면들은 용융 아연도금되고, 상기 가스와 접촉하게 되는 상기 표면들은, 용융 아연도금 후에, 400 내지 750℃ 범위의 온도에서 열처리된다. 본 발명은 또한 열교환기의 사용에 관한 것이다. The invention relates to a heat exchanger for heating gas to a temperature in the range from 150 to 400° C., wherein the gas is heated by indirect heat transfer and all the surfaces of the walls of the heat exchanger which come into contact with the gas have been hot dip galvanized and the surfaces which come into contact with the gas, after the hot dip galvanization, have been heat treated at a temperature in the range from 400 to 750° C.The invention further relates to the use of the heat exchanger.