높은 유전 상수를 갖는 광-이미지 형성 가능한 박막

광-이미지 형성 가능한 막을 제조하기 위한 제형은 (a) 폴리실록산 바인더 및 광-활성 종을 포함하는 포지티브형 포토레지스트; 및 (b) 작용화된 산화지르코늄 나노입자를 포함한다. A formulation for preparing a photo-imageable film; said formulation comprising: (a) a positive photoresist comprising a polysiloxane binder and a photo-active species; and (b) functionalized zirconi...

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Bibliographic Details
Main Authors WOELFLE GUPTA CAROLINE, HAN, SEOK, RAO YUANQIAO, WOODWARD WILLIAM H. H
Format Patent
LanguageKorean
Published 27.08.2018
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:광-이미지 형성 가능한 막을 제조하기 위한 제형은 (a) 폴리실록산 바인더 및 광-활성 종을 포함하는 포지티브형 포토레지스트; 및 (b) 작용화된 산화지르코늄 나노입자를 포함한다. A formulation for preparing a photo-imageable film; said formulation comprising: (a) a positive photoresist comprising a polysiloxane binder and a photo-active species; and (b) functionalized zirconium oxide nanoparticles.
Bibliography:Application Number: KR20187018079