INFRARED CUT OFF FILM FILM TYPE INFRARED CUT OFF FILTER USING THE SAME AND THE MANUFACTURING METHOD THEEBY

The present invention relates to an infrared cut-off film and a manufacturing method thereof. The infrared cut-off film comprises: a transparent film; a light absorption layer formed on at least one surface of the transparent substrate, and including a heat resistant resin, a heat resistant dye, and...

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Bibliographic Details
Main Authors LEE, TAE GEUN, LEE, GWANG HYEONG
Format Patent
LanguageEnglish
Korean
Published 17.08.2018
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Summary:The present invention relates to an infrared cut-off film and a manufacturing method thereof. The infrared cut-off film comprises: a transparent film; a light absorption layer formed on at least one surface of the transparent substrate, and including a heat resistant resin, a heat resistant dye, and a non-heat resistant dye; an adhesive layer formed between the transparent substrate and the light absorption layer; and a heat-radiation layer formed on the light absorption layer. 본 발명은 투명 기판; 상기 투명 기판의 어느 1면 이상에 형성되는, 내열성 수지, 내열성 염료 및 비내열성 염료를 포함하는 광흡수층; 상기 투명 기판과 상기 광흡수층의 사이에 형성되는 접착층; 및 상기 광흡수층 상에 형성된 발열층;을 포함하는 적외선 차단 필름 및 이의 제조방법에 관한 것이다.
Bibliography:Application Number: KR20180046017