연속 진공에서 다중 플라즈마 코팅층의 적용

• Main Authors: YAO HUAZHEN, NIU YAMING, JIANG SIGUANG, THAKORE ASHIR, LAI HENGJIE, LIU CHAO
• Format: Patent
• Language: Korean
• Published: 31.07.2018
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; PHYSICS; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

진공에서 다중 플라즈마 코팅층을 적용하기 위한 장치 및 공정, 및 상기 공정으로부터 생성된 물품. 상기 공정은 기질을 진공 쳄버에 배치시키는 단계, 및 진공의 중단 없이 기질에 다중 플라즈마 코팅층을 적용하는 단계를 포함한다. A device and a process for applying multiple plasma coating layers in a vacuum, and a product created from that process. The process includes disposing a substrate in a vacuum chamber and applying multiple plasma coating layers to the substrate without breaking vacuum.