FILM FORMING COMPOSITION AND ION IMPLANTATION METHOD

• Main Authors: OHASHI TOMOYA, KISHIOKA TAKAHIRO
• Format: Patent
• Language: English; Korean
• Published: 17.07.2018
• Subjects: ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM; APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; METALLURGY; ORGANIC CHEMISTRY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; THEIR PREPARATION OR CHEMICAL WORKING-UP

[과제] 이온주입방법 및 이온주입용 막형성 조성물 및 레지스트 하층막 형성 조성물을 제공하는 것. [해결수단] 13족, 14족, 15족 또는 16족의 원소를 포함하는 화합물 및 유기용제를 포함하는 막형성 조성물을 기판 상에 도포하고 베이크하여 막을 형성하는 공정, 불순물 이온을 상기 막의 상방으로부터 상기 막을 개재하여 상기 기판에 주입함과 동시에, 상기 막 중의 13족, 14족, 15족 또는 16족의 원소를 상기 기판 중에 도입하는 공정을 포함하는, 이온주입방법. 상기 막형성 조성물은, 13족, 14족, 15족 또는 16족의 원소를 포함하는 화합물 및 유기용제를 포함하는 이온주입용 막형성 조성물이다. 또한, 적어도 2개의 붕산에스테르기를 가지는 화합물을 포함하는 레지스트 하층막 형성 조성물이다. There is provided an ion implantation method, a composition for forming an ion implantation film and a resist underlayer film-forming composition. An ion implantation method including the steps of: forming a film by applying a film-forming composition containing a compound including an element in group 13, group 14, group 15, or group 16 and an organic solvent onto a substrate and baking the film-forming composition; and implanting impurity ions into the substrate from above through the film and introducing the element in group 13, group 14, group 15, or group 16 in the film into the substrate. The film-forming composition is a film-forming composition for ion implantation containing a compound including an element in group 13, group 14, group 15, or group 16, and an organic solvent. In addition, the underlayer film-forming composition contains a compound having at least two borate ester groups.