Negative photosensitive resin composition

Disclosed is a negative photosensitive resin composition which not only can simplify a pattern forming method, but also is usefully used in a display with high luminance and low power consumption by having excellent sensitivity, planarization, resolving power, residues and other properties, and simu...

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Bibliographic Details
Main Authors YOUN, HYOC MIN, JEONG, JONG HO, YUN, JOO PYO, HWANG, HYUN MIN, BYEON, JEONG HYEON
Format Patent
LanguageEnglish
Korean
Published 09.07.2018
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:Disclosed is a negative photosensitive resin composition which not only can simplify a pattern forming method, but also is usefully used in a display with high luminance and low power consumption by having excellent sensitivity, planarization, resolving power, residues and other properties, and simultaneously proceeding processes of forming white subpixels and an interlayer dielectric film particularly in an RGBW structure. The negative photosensitive resin composition comprises: an acrylic copolymer; a multifunctional urethane-based methacrylate compound represented by chemical formula 1; a radical photoinitiator; and a solvent. In chemical formula 1, D is a hydrocarbon group having 1 to 20 carbon atoms, and n and m are each independently an integer of 0 to 2. 감도, 평탄화, 해상력, 잔사 등이 우수하고, 특히 RGBW 구조에서 화이트 서브픽셀 및 층간절연막 형성 공정을 동시에 진행함으로서, 패턴 형성 방법을 간소화할 수 있을 뿐만 아니라, 고휘도 및 소비 전력이 낮은 디스플레이에 사용하기에 유용한 네가티브 감광성 수지 조성물이 개시된다. 상기 네가티브 감광성 수지 조성물은 아크릴계 공중합체; 하기 화학식 1로 표시되는 다관능 우레탄계 메타아크릴레이트 화합물; 라디칼 광개시제; 및 용매;를 포함한다. [화학식 1]상기 화학식 1에서, D는 탄소수 1 내지 20의 탄화수소기이고, n 및 m은 각각 독립적으로 0 내지 2의 정수이다.
Bibliography:Application Number: KR20160182393