LIQUID RECOVERY APPARATUS EXPOSURE APPARATUS EXPOSURE METHOD AND DEVICE PRODUCTION METHOD

• Main Authors: TAKAIWA HIROAKI, ARAI DAI, HARA HIDEAKI
• Format: Patent
• Language: English; Korean
• Published: 06.07.2018
• Subjects: ACCESSORIES THEREFOR; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM; APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

이 노광장치는 투영광학계와 기판 사이를 액체로 채우고, 투영광학계와 액체를 통해 기판상에 패턴 이미지를 투영함으로써 기판을 노광한다. 이 노광장치는 상용 전원으로부터 공급되는 전력에 의해 구동되는 구동부를 갖는 액체회수기구와, 상용 전원과는 다른 무정전 전원을 구비하고, 상용 전원의 정전시에 구동부에 대한 전력의 공급이 무정전 전원으로 전환된다. An exposure apparatus exposes a substrate by projecting an image of a pattern onto the substrate via a projection optical system and a liquid that fills a gap between the projection optical system and the substrate. The exposure apparatus has a liquid recovery mechanism with a drive section powered by electric power supplied from a commercial power source and an uninterruptible power source separate from the commercial power source. When the commercial power source has a failure, the supply of electric power to the drive section is switched to the uninterruptible power source.