SPUTTERING TARGET AND THIN FILM FORMED BY USING THE SAME
The present invention relates to a sputtering target having low resistivity, and a transparent conductive thin film formed therefrom, wherein the thin film is an amorphous thin film formed from the sputtering target, which exhibits low resistance and improves high light transmittance and high-temper...
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Main Authors | , , , |
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Format | Patent |
Language | English Korean |
Published |
21.06.2018
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Subjects | |
Online Access | Get full text |
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