SUTTER UNIT and SUBSTRATE PROCESSING APPARATUS HAVING THE SAME

• Main Authors: SEO, JEONG HYUP, MOON, HYUN CHUL
• Format: Patent
• Language: English; Korean
• Published: 18.06.2018
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

Provided are a shutter unit for selectively sealing an entrance hole in which a substrate is entered and discharged, and a semiconductor substrate treating apparatus having the same. A shutter unit is arranged on a process chamber housing of a semiconductor substrate treating apparatus having an entrance hole in which a substrate is entered and discharged. The shutter unit comprises: a door part for selectively opening and closing an entrance hole of a housing; an operation part for opening and closing the entrance hole by operating the door part in the inclined direction; and a connection part for connecting the door part to the operation part. The posture of the door part is maintained in parallel with the housing without the change even during the operation by the operation part. 기판이 출입되는 출입구를 선택적으로 밀폐하는 셔터유닛과 이를 구비한 반도체 기판 처리장치가 제공된다. 기판이 출입되는 출입구를 구비한 반도체 기판 처리장치의 공정챔버 하우징에 구비된 셔터유닛은, 하우징의 출입구를 선택적으로 개폐하는 도어파트와, 도어파트를 경사진 방향으로 구동시켜 출입구를 개폐하는 구동파트 및 도어파트와 구동파트를 연결하는 연결파트를 포함하고, 도어파트의 자세는 구동파트에 의한 구동 중에도 변함없이 하우징과 평행하게 유지된다.