AROMATIC RESINS FOR UNDERLAYERS

• Main Authors: SUZANNE M. COLEY, SHINTARO YAMADA, JOSHUA A. KAITZ, SHENG LIU, KEREN ZHANG, LI CUI, JAMES F. CAMERON
• Format: Patent
• Language: English; Korean
• Published: 14.06.2018
• Subjects: ADHESIVES; APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMICAL PAINT OR INK REMOVERS; CHEMISTRY; CINEMATOGRAPHY; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS; COMPOSITIONS BASED THEREON; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS; CORRECTING FLUIDS; DYES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; FILLING PASTES; HOLOGRAPHY; INKS; MATERIALS THEREFOR; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PAINTS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; POLISHES; SEMICONDUCTOR DEVICES; THEIR PREPARATION OR CHEMICAL WORKING-UP; USE OF MATERIALS THEREFOR; WOODSTAINS

Provided are a colored photosensitive resin composition which is excellent in time passage stability of viscosity and patterning characteristics; a color filter formed by using the colored photosensitive resin composition; and a display device including the color filter. The colored photosensitive resin composition related to the present invention comprises an alkali-soluble resin, a photopolymerizable monomer, a photopolymerization initiator, an inorganic pigment and a solvent, wherein the solvent includes a solvent with an amide structure. It is preferable to represent the solvent with the amide structure by formula (1) or (2). In formulas 1 and 2, R^1, R^2 and R^3 each independently indicate a hydrogen atom or an alkyl group, and n indicates an integer of 1 to 3. 폴리아릴렌 수지 및 이를 함유하는 조성물은 반도체 제조 공정에서 하지층으로서 유용하다.