NEW DEVELOPER FOR LITHOGRAPHY

A method for lithography patterning includes the following steps: forming a material layer of on the upper side of a substrate; exposing a portion of the material layer to radiation rays; and removing the exposed portion of the material layer from a developer to produce a patterned material layer. T...

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Bibliographic Details
Main Authors LIU CHEN YU, CHANG CHING YU
Format Patent
LanguageEnglish
Korean
Published 31.05.2018
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:A method for lithography patterning includes the following steps: forming a material layer of on the upper side of a substrate; exposing a portion of the material layer to radiation rays; and removing the exposed portion of the material layer from a developer to produce a patterned material layer. The developer of the present invention includes an organic solvent and a basic solute, wherein the content of the organic solvent is greater than 50% based on the weight. According to an embodiment, the developer additionally contains less than 50% of water based on the weight. 리소그래피 패터닝 방법은, 기판 상부에 재료층을 형성하는 단계; 복사선에 재료층의 일부분을 노광시키는 단계; 및 현상제에서 재료층의 노광된 부분을 제거하여, 패터닝된 재료층을 생성하는 단계를 포함한다. 현상제는 유기 용매 및 염기성 용질을 포함하고, 유기 용매는 중량 기준으로 현상제의 50% 초과이다. 일실시예에 있어서, 현상제는 중량 기준으로 현상제는 50% 미만의 물을 더 포함한다.
Bibliography:Application Number: KR20180058240