SEMICONDUCTOR DEVICE
An embodiment of the present invention provides a semiconductor device which includes a substrate including an active region, a gate structure disposed in the active region, source/drain regions formed in the active region on both sides of the gate structure, respectively, a metal silicide film disp...
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Main Authors | , , , , , , , , |
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Format | Patent |
Language | English Korean |
Published |
17.05.2018
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Subjects | |
Online Access | Get full text |
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Summary: | An embodiment of the present invention provides a semiconductor device which includes a substrate including an active region, a gate structure disposed in the active region, source/drain regions formed in the active region on both sides of the gate structure, respectively, a metal silicide film disposed on the surfaces of the source/drain regions and composed of a monocrystalline structure, and contact plugs disposed on the source/drain regions and electrically connected to the source/drain regions through the metal silicide film. Accordingly, the present invention can improve reliability and electrical characteristics.
본 발명의 일 실시예는, 활성 영역을 갖는 기판과, 상기 활성 영역에 배치된 게이트 구조물과, 상기 게이트 구조물의 양측에 위치한 상기 활성 영역 내에 각각 형성된 소스/드레인 영역들과, 상기 소스/드레인 영역들의 표면에 배치되며 단결정 구조(monocrytalline structure)로 이루어진 금속 실리사이드막과, 상기 소스/드레인 영역들 상에 배치되며 상기 금속 실리사이드막을 통해 상기 소스/드레인 영역들에 각각 전기적으로 연결된 콘택 플러그들을 포함하는 반도체 장치를 제공한다. |
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Bibliography: | Application Number: KR20160148684 |