Thinner composition

• Main Authors: KIM, KWANG HO, HAN, DOO SEOK, LEE, DU WON, LEE, SANG DAI, PARK, JUN HYUN
• Format: Patent
• Language: English; Korean
• Published: 10.05.2018
• Subjects: ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES; APPARATUS SPECIALLY ADAPTED THEREFOR; CANDLES; CHEMISTRY; CINEMATOGRAPHY; DETERGENT COMPOSITIONS; DETERGENTS; ELECTROGRAPHY; FATTY ACIDS THEREFROM; HOLOGRAPHY; MATERIALS THEREFOR; METALLURGY; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; RECOVERY OF GLYCEROL; RESIN SOAPS; SOAP OR SOAP-MAKING; USE OF SINGLE SUBSTANCES AS DETERGENTS

The present invention relates to a thinner composition which can be used in a photolithography process during a semiconductor device production process. More specifically, provided is a thinner composition which ensures excellent solubility in various photoresists, hardly stinks, prevents defects in particle production, and suppresses build-up of edge bead removal (EBR). To this end, the thinner composition contains propylene glycol monomethyl ether acetate and propylene glycol monoethyl ether. 본 발명은 반도체 소자의 제조 공정 중 포토리소그래피 공정에 사용할 수 있는 신너 조성물에 관한 것으로, 보다 상세하게, 다양한 포토레지스트에 대한 용해도가 우수하면서도, 냄새가 심하지 않고, 입자 생성 불량을 방지하며, EBR면 증가(build-up) 현상을 억제할 수 있는 신너 조성물을 제공한다.