EUV OPTICAL ASSEMBLY IN PARTICULAR IN AN EUV LITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

The purpose of the present invention is to provide an optical assembly in an optical system, particularly in an extreme ultraviolet (EUV) lithographic protection exposure apparatus, the optical assembly which allows effective protection from contaminants while damaging transmission characteristics o...

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Bibliographic Details
Main Authors EHM DIRK HEINRICH, KALLER JULIAN
Format Patent
LanguageEnglish
Korean
Published 23.03.2018
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:The purpose of the present invention is to provide an optical assembly in an optical system, particularly in an extreme ultraviolet (EUV) lithographic protection exposure apparatus, the optical assembly which allows effective protection from contaminants while damaging transmission characteristics of the projection exposure apparatus as less as possible. The optical assembly particularly in the EUV lithographic protection exposure apparatus of the present invention comprises: a housing in which a plurality of optical elements are arranged; and a plurality of sub-housings (201-205, 301-304) as a plurality of sub-housings which are arranged in the housing, wherein each sub-housing surrounds beams which are incident on the optical elements during operation of at least one of the optical elements and the optical system, and an inner part of each of the sub-housings (201-205, 301-304) is connected to an outer part of each of the sub-housings via at least one opening, each of the sub-housings (201-205, 301-304) has an individual gas supply unit allocated therein, and an individual gas atmosphere is capable of being individually applied to the inner part of the related sub-housings (201-205, 301-304) via the individual gas supply unit. 본 발명은 특히 EUV 리소그래픽 투영 노광 장치 내의 광학 조립체이며, 복수의 광학 요소가 배열되어 있는 하우징과, 상기 하우징 내에 배열된 복수의 서브하우징으로서, 상기 서브하우징의 각각은 각각의 경우에 광학 요소 중 적어도 하나 및 광학 시스템의 동작 중에 광학 요소 상에 입사되는 빔을 포위하고, 각각의 서브하우징(201 내지 205, 301 내지 304)의 내부는 적어도 하나의 개구를 거쳐 각각의 서브하우징의 외부에 연결되는, 복수의 서브하우징(201 내지 205, 301 내지 304)을 포함하고, 상기 서브하우징(201 내지 205, 301 내지 304)의 각각은 개별 가스 공급부가 할당되고, 이 개별 가스 공급부를 거쳐 관련 서브하우징(201 내지 205, 301 내지 304)의 내부는 개별 가스 분위기가 개별적으로 인가되는 것이 가능한 광학 조립체에 관한 것이다.
Bibliography:Application Number: KR20170116261