MEASUREMENT METHOD STAGE APPARATUS AND EXPOSURE APPARATUS

• Main Author: ARAI DAI
• Format: Patent
• Language: English; Korean
• Published: 21.03.2018
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; HOLOGRAPHY; MATERIALS THEREFOR; MEASURING; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION; TECHNICAL SUBJECTS COVERED BY FORMER USPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS; TESTING

주위 기체의 굴절률 변동의 영향을 저감시켜, 스테이지의 위치 결정 정밀도 등을 향상시킬 수 있는 노광 장치이다. 투영 광학계 (PL) 를 개재하여 웨이퍼 스테이지 (WST) 상의 웨이퍼 (W) 에 노광용 조명광을 조사하고, 웨이퍼 (W) 에 소정 패턴을 형성하는 노광 장치로서, 웨이퍼 스테이지 (WST) 에 형성된 스케일과, 이 스케일의 위치 정보를 검출하는 복수의 X 헤드 (66) 와, 복수의 X 헤드 (66) 를 일체적으로 지지하고, 선 팽창률이 웨이퍼 스테이지 (WST) 의 본체부보다 작은 계측 프레임 (21) 과, 복수의 X 헤드 (66) 의 검출 결과로부터 웨이퍼 스테이지 (WST) 의 변위 정보를 구하는 제어 장치를 구비한다. An exposure apparatus can mitigate the impact of fluctuations in the refractive index of ambient gas, and improve, for example, stage positioning accuracy. An exposure apparatus radiates an exposure illumination light to a wafer (W) on a wafer stage (WST) through a projection optical system (PL), and forms a prescribed pattern on the wafer (W), and comprises: a scale, which is provided to the wafer stage (WST); a plurality of X heads (66), which detect information related to the position of the scale; a measurement frame (21) that integrally supports the plurality of X heads (66) and has a coefficient of linear thermal expansion that is smaller than that of the main body of the wafer stage (WST); and a control apparatus that derives information related to the displacement of the wafer stage (WST) based on the detection results of the plurality of X heads (66).