금속 및 금속 합금 제조를 위한 열 처리 방법

• Main Authors: FERRASSE STEPHANE, STROTHERS SUSAN D, ALFORD FRANK C
• Format: Patent
• Language: Korean
• Published: 02.03.2018
• Subjects: ALLOYS; BASIC ELECTRIC ELEMENTS; CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS ANDNON-FERROUS ALLOYS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY; FERROUS OR NON-FERROUS ALLOYS; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TREATMENT OF ALLOYS OR NON-FERROUS METALS

본 개시내용은, 제 1 금속 물질을 용해시키는 단계; 제 1 금속 물질에 등통로각압출을 가하는 단계; 및 제 1 금속 물질을 에이징시키는 단계를 포함하는, 스퍼터링 표적과 함께 사용하기 위한 고강도 백킹 플레이트를 형성하는 방법을 포함한다. The current disclosure includes a method of forming a high strength backing plate for use with a sputtering target comprising solutionizing a first metal material; subjecting the first metal material to equal channel angular extrusion; and aging the first metal material.