THERMAL DESORPTION SYSTEM AND METHOD OF ANALYZING A SUBSTRATE USING THE SAME

A thermal desorption system comprises: a chamber providing a space to heat a substrate; a flow compartment arranged in the chamber, and providing a gas flow space divided in a space of the chamber; a substrate support unit to support the substrate within the flow compartment; a heating device to hea...

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Bibliographic Details
Main Authors MOON, HYE KYOUNG, SUK, KYUNG JU, LIM, KWANG SHIN, PARK, EUN HEE, KIM, SANG HWAN, PARK, JUNG DAE, SUH, MIN SOO
Format Patent
LanguageEnglish
Korean
Published 21.02.2018
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
SEMICONDUCTOR DEVICES
TESTING
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Summary:A thermal desorption system comprises: a chamber providing a space to heat a substrate; a flow compartment arranged in the chamber, and providing a gas flow space divided in a space of the chamber; a substrate support unit to support the substrate within the flow compartment; a heating device to heat the substrate within the flow compartment; and a gas pipe device to enable carrier gas to be introduced into and discharged from the flow compartment from the outside of the chamber. 열 탈착 시스템은 기판을 가열하기 위한 공간을 제공하는 챔버, 상기 챔버 내에 배치되며 상기 챔버 공간 내의 구분된 가스 유동 공간을 제공하는 유동 격실, 상기 유동 격실 내에서 상기 기판을 지지하기 위한 기판 지지부, 상기 유동 격실 내의 상기 기판을 가열하기 위한 가열 장치, 및 상기 챔버 외부로부터 상기 유동 격실 내로 캐리어 가스를 유입 및 유출시키기 위한 가스 배관 장치를 포함한다.
Bibliography:Application Number: KR20160101659