METHOD FOR PRODUCING A SUPERJUNCTION DEVICE
Disclosed is a method which comprises a step of forming a plurality of semiconductor arrangements by overlapping one another. In the method, the step of forming each of the plurality of semiconductor arrangements includes the steps of: forming a semiconductor layer; forming a plurality of trenches o...
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Main Authors | , , , , , , , , |
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Format | Patent |
Language | English Korean |
Published |
24.01.2018
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Subjects | |
Online Access | Get full text |
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Summary: | Disclosed is a method which comprises a step of forming a plurality of semiconductor arrangements by overlapping one another. In the method, the step of forming each of the plurality of semiconductor arrangements includes the steps of: forming a semiconductor layer; forming a plurality of trenches on a first surface of the semiconductor layer; and injecting at least one of first and second types of dopant atoms into either a first sidewall or a second sidewall of each of the plurality of trenches of the semiconductor layer.
서로 중첩해서 복수의 반도체 어레인지먼트를 형성하는 단계를 포함하는 방법이 개시된다. 이 방법에서, 복수의 반도체 어레인지먼트 각각을 형성하는 단계는, 반도체 층을 형성하는 단계와, 상기 반도체 층의 제 1 표면에 복수의 트렌치를 형성하는 단계와, 상기 반도체 층의 상기 복수의 트렌치 각각의 제 1 측면과 제 2 측면 중 하나에, 제 1 타입과 제 2 타입 중 적어도 하나의 도펀트 원자를 주입하는 단계를 포함한다. |
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Bibliography: | Application Number: KR20170089021 |