PHOTOCURABLE RESIN COMPOSITION CURED FILM FORMED OF COMPOSITION AND BASE MATERIAL WITH COATING FILM AND METHOD FOR PRODUCING CURED FILM AND BASE MATERIAL WITH COATING FILM

• Main Authors: KAMEDA YOSHINORI, YONE YASUNORI
• Format: Patent
• Language: English; Korean
• Published: 17.01.2018
• Subjects: ADHESIVES; CHEMICAL PAINT OR INK REMOVERS; CHEMISTRY; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS; COMPOSITIONS BASED THEREON; CORRECTING FLUIDS; DYES; FILLING PASTES; INKS; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; ORGANIC MACROMOLECULAR COMPOUNDS; PAINTS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; POLISHES; THEIR PREPARATION OR CHEMICAL WORKING-UP; USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS; USE OF MATERIALS THEREFOR; WOODSTAINS

A cured coating film having excellent weather resistance, scratch resistance and anti-glare properties is formed. Provided is a photocurable resin composition containing (meth)acrylate (A), (meth)acrylate monomers (B), spherical silica particles (C), a UV absorber (D), a fluorine-based compound (E) having a photopolymerizable unsaturated group and a photopolymerization initiator (F). 내후성, 내스크래치성 및 안티글레어성이 우수한 경화 피막을 형성한다. 지방족 우레탄 (메타)아크릴레이트(A)와, (메타)아크릴레이트 모노머(B)와, 구상 실리카 입자(C)와, 자외선 흡수제(D)와, 광중합성 불포화 기를 갖는 불소계 화합물(E)과, 광중합 개시제(F)를 함유하는 광경화성 수지 조성물이 제공된다.