VACUUM FILM-FORMING APPARATUS

• Main Authors: SATO TOMOYUKI, ISHII HIROSHI, KOUNO TAKASHI
• Format: Patent
• Language: English; Korean
• Published: 17.01.2018
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The purpose of the present invention is to provide a vacuum film forming apparatus capable of suppressing misalignment between a substrate and a mask due to distortion of a chamber wall of a vacuum chamber with a simple configuration. The vacuum film forming apparatus comprises: a vacuum chamber (1); a substrate support (3) and a mask support (5) provided in the vacuum chamber (1); and an alignment mechanism (6) provided on the outside of the vacuum chamber (1) and for adjusting a relative position of a substrate (2) supported by the substrate support (3) and a mask (4) supported by the mask support (5). The vacuum film forming apparatus is provided with a first fixing member (7) in which the alignment mechanism (6) connected with the substrate support (3) is provided, and which is in contact with an outer surface of the chamber wall of the vacuum chamber (1) to be fixed thereto, and a second fixing member (8) in which the mask support (5) is provided and which is in contact with an inner surface of the chamber wall of the vacuum chamber (1) to be fixed thereto. A contact end portion (9) of the first fixing member (7) with the outer surface of the chamber wall and a contact end portion (10) of the second fixing member (8) with the inner surface of the chamber wall are provided at positions facing each other with the chamber wall therebetween. [과제] 간이한 구성으로 진공조의 조 벽의 일그러짐에 기인하는 기판과 마스크와의 위치 어긋남을 억제할 수 있는 진공 성막 장치의 제공. [해결 수단] 진공조(1)와, 이 진공조(1) 내에 설치되는 기판 지지체(3) 및 마스크 지지체(5)와, 진공조(1) 밖에 설치되고 기판 지지체(3)에 지지된 기판(2)과 마스크 지지체(5)에 지지된 마스크(4)와의 상대 위치를 조정하기 위한 얼라인먼트 기구(6)를 구비한 진공 성막 장치로서, 기판 지지체(3)가 접속된 얼라인먼트 기구(6)가 설치되고 진공조(1)의 조 벽 외면에 접촉 고정되는 제1 고정 부재(7)와, 마스크 지지체(5)가 설치되고 진공조(1)의 조 벽 내면에 접촉 고정되는 제2 고정 부재(8)를 갖고, 제1 고정 부재(7)의 조 벽 외면과의 접촉 단부(9)와 제2 고정 부재(8)의 조 벽 내면과의 접촉 단부(10)를 조 벽을 사이에 두고 대향 위치에 설치한다.