리소그래피 장치

• Main Authors: LEVASIER LEON MARTIN, VAN DER SANDEN JACOBUS CORNELIS GERARDUS, OVERKAMP JIM VINCENT, KOEVOETS ADRIANUS HENDRIK, DERKS SANDER CATHARINA REINIER, JANSSEN FRANCISCUS JOHANNES JOSEPH, DONDERS SJOERD NICOLAAS LAMBERTUS, ARLEMARK ERIK JOHAN, LAFARRE RAYMOND WILHELMUS LOUIS, ENDENDIJK WILFRED EDWARD, TEN KATE NICOLAAS
• Format: Patent
• Language: Korean
• Published: 26.12.2017
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

기판 테이블 상에 유지된 기판에 노광 영역을 형성하기 위해 패터닝된 방사선 빔을 투영하도록 구성되는 투영 시스템을 포함한 리소그래피 장치가 개시되고, 리소그래피 장치는 기판을 냉각하는 냉각 장치(40)를 더 포함하며, 냉각 장치는 노광 영역에 인접하고 기판 테이블 위에 위치되는 냉각 요소(42, 44)를 포함하며, 냉각 요소는 기판으로부터 열을 제거하도록 구성된다. A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.