임프린트 장치, 임프린트 방법 및 물품의 제조 방법

• Main Author: TERAO TSUTOMU
• Format: Patent
• Language: Korean
• Published: 05.12.2017
• Subjects: AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING; APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR; SHAPING OR JOINING OF PLASTICS; TRANSPORTING; WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

본 발명은 기판 상의 임프린트재에 몰드를 사용해서 패턴을 형성하는 임프린트 처리를 행하는 임프린트 장치를 제공하며, 상기 장치는 기판을 촬상해서 화상을 취득하도록 구성된 촬상 유닛, 및 몰드와 기판 사이에 존재하는 이물질을 검출하는 검출 처리를 행하도록 구성된 처리 유닛을 포함하고, 처리 유닛은 기준 화상과, 몰드와 기판 상의 임프린트재가 서로 접촉한 상태에서 상기 촬상 유닛에 의해 취득된 화상을 비교함으로써 검출 처리를 행하며, 화상이 기판 외부 영역을 포함하는 경우, 기판 외부 영역은 검출 처리의 대상으로부터 제외된다. The present invention an imprint apparatus which performs an imprint process of forming a pattern in an imprint material on a substrate using a mold, the apparatus including an image capturing unit configured to obtain an image by capturing the substrate, and a processing unit configured to perform detection processing of detecting a foreign particle present between the mold and the substrate, wherein the processing unit performs the detection processing by comparing, with a reference image, an image obtained by the image capturing unit in a state in which the mold and the imprint material on the substrate are in contact with each other, and when the image includes a region outside the substrate, the region outside the substrate is excluded from a target of the detection processing.