Thinner composition

• Main Authors: HAN, DOO SEOK, LEE, DU WON
• Format: Patent
• Language: English; Korean
• Published: 22.09.2017
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; FREQUENCY-CHANGING; HOLOGRAPHY; MATERIALS THEREFOR; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL LOGIC ELEMENTS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF

The present invention relates to a thinner composition which is used in a process of removing a photoresist film in a photolithography process. The purpose of the present invention is to provide a thinner composition which has excellent cleaning power and edge bead remove (EBR) properties and particularly prevents occurrence of whitening phenomenon with respect to a photoresist used in manufacturing processes of a semiconductor device and a thin film transistor liquid crystal display device. The thinner composition of the present invention comprises: 30 to 50 wt% of butyl acetate; 20 to 40 wt% of propylene glycol monomethyl ether; and 10 to 30 wt% of propylene glycol monomethyl ether acetate based on 100 wt% of the total composition. 본 발명은 포토리소그래피 공정에서 사용되는 신너 조성물로서, 부틸아세테이트 30~50 중량%; 프로필렌글리콜모노메틸에테르 20~40 중량%; 및 프로필렌글리콜모노메틸에테르아세테이트 10~30 중량%를 포함한다.