ECHTANT AND METHOD FOR MANUFACTURING DISPLAY DEVICE USING THE SAME
An etchant according to an embodiment of the present invention comprises 0.5 to 20 wt% of persulfate, 0.01 to 2 wt% of a fluorine compound, 1 to 10 wt% of inorganic acid, 0.5 to 5 wt% of a cyclic amine compound, 0.1 to 5 wt% a chlorine compound, 0.05 to 3 wt% of copper salt, 0.1 to 10 wt% of organic...
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Main Authors | , , , , , , , , , , , , , , , |
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Format | Patent |
Language | English Korean |
Published |
20.09.2017
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Subjects | |
Online Access | Get full text |
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Summary: | An etchant according to an embodiment of the present invention comprises 0.5 to 20 wt% of persulfate, 0.01 to 2 wt% of a fluorine compound, 1 to 10 wt% of inorganic acid, 0.5 to 5 wt% of a cyclic amine compound, 0.1 to 5 wt% a chlorine compound, 0.05 to 3 wt% of copper salt, 0.1 to 10 wt% of organic acid or organic acid salt, and water. The etchant provides an excellent etching profile for a titanium/copper double film.
본 발명의 실시예에 따른 식각액은 과황산염 0.5 내지 20 중량%, 불소화합물 0.01 내지 2 중량%, 무기산 1 내지 10 중량%, 고리형 아민화합물 0.5 내지 5 중량%, 염소화합물 0.1 내지 5 중량%, 구리염 0.05 내지 3 중량%, 유기산 또는 유기산염 0.1 내지 10 중량%, 그리고 물을 포함한다. |
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Bibliography: | Application Number: KR20170114753 |