Multipurpose Thinner Composition for removing Resist

• Main Authors: SONG, JUNG HWAN, KIM, BYEOUNG TAK, YU, SUN, JEON, SEONG SIK, LEE, SOK HO
• Format: Patent
• Language: English; Korean
• Published: 20.09.2017
• Subjects: ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES; APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CANDLES; CHEMISTRY; CINEMATOGRAPHY; DETERGENT COMPOSITIONS; DETERGENTS; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; FATTY ACIDS THEREFROM; FREQUENCY-CHANGING; HOLOGRAPHY; MATERIALS THEREFOR; METALLURGY; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL LOGIC ELEMENTS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; RECOVERY OF GLYCEROL; RESIN SOAPS; SEMICONDUCTOR DEVICES; SOAP OR SOAP-MAKING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; USE OF SINGLE SUBSTANCES AS DETERGENTS

An integrated process thinner composition according to the present invention relates to an integrated process thinner composition which removes photosensitive resins used in processes of manufacturing semiconductor elements and thin-film transistor liquid crystal display elements, removes colored photosensitive resins used in color filter processes, and removes photosensitive resins used in organic light emitting diode (OLED) processes. The integrated process thinner composition comprises: 80 to 97 wt% of propylene glycol monomethyl ether (PGME); 1 to 10 wt% of ketones; and 1 to 10 wt% of ethyl-3-ethoxypropionate (EEP). The integrated process thinner composition further comprises 1 to 5 wt% of normal butyl acetate (n-BA). Compared to the conventional thinner composition, the thinner composition according to the present invention has advantages that the thinner composition according to the present invention can be used in removing photo resists or color resists of various processes, can be effectively cleaned, does not generate an efflorescence phenomenon that becomes a contamination source. Furthermore, the thinner composition according to the present invention can effectively remove a trace of propylene glycol monomethyl ether acetate (PGMEA) generated during thinner regeneration. 본 발명에 따른 통합 공정 씬너 조성물은, 반도체 소자 및 박막트렌지스터 액정표시소자 제조공정에 사용되는 감광성 수지 제거, 컬러필터 공정에 사용되는 컬러 감광성 수지 제거 및 OLED 공정에 사용되는 감광성 수지 제거의 통합공정용 씬너 조성물에 관한 것으로, 프로필렌글리콜모노메틸에테르(PGME) 80 내지 97 중량 %; 케톤류(Ketone) 1 내지 10 중량 %; 및 에틸-3-에톡시프로피오네이트(EEP) 1 내지 10 중량 %를 포함하여 이루어지는 것이다. 또한, 본 발명에 따른 통합 공정 씬너 조성물은 프로필렌글리콜모노메틸에테르(PGME) 80 내지 97 중량 %; 케톤류(Ketone) 1 내지 10 중량 %; 에틸-3-에톡시프로피오네이트(EEP) 1 내지 10 중량 % 및, 노말부틸 아세테이트 (n-BA) 1 내지 5중량% 더 포함하여 이루어진다. 본 발명에 따른 씬너 조성물은 종래의 씬너 조성물에 비해 다양한 공정의 감광제를 제거하는데 사용할 수 있으며, 효과적으로 세정 가능하며, 오염원이 되는 백화현상이 일어나지 않은 이점이 있다. 또한, 씬너 재생 시에 발생하는 미량의 프로필렌글리콜모노메틸에테르아세테이트(PGMEA)를 효과적으로 제거 할 수 있다.