QUARTZ CRYSTAL MICROBALANCE ASSEMBLY FOR ALD SYSTEMS

A quartz crystal microbalance (QCM) assembly includes a lid of a reactor chamber of an atomic layer deposition (ALD) system. A QCM crystal is disposed on a bottom section of a central cavity formed in the lid. A central portion of a front surface of the QCM crystal is exposed to an interior of the r...

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Bibliographic Details
Main Authors RUFFO MICHAEL, LECORDIER LAURENT
Format Patent
LanguageEnglish
Korean
Published 18.09.2017
Subjects
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
MEASURING
METALLURGY
PHYSICS
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
TESTING
WEIGHING
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Summary:A quartz crystal microbalance (QCM) assembly includes a lid of a reactor chamber of an atomic layer deposition (ALD) system. A QCM crystal is disposed on a bottom section of a central cavity formed in the lid. A central portion of a front surface of the QCM crystal is exposed to an interior of the reactor chamber. A retainer arranged within the central cavity and above the QCM crystal presses the QCM crystal against a ledge in the lid to form a seal between the front surface of the QCM crystal and the ledge while also establishing electric contact with the QCM crystal. A flange resides immediately adjacent a top surface of the lid, and seals a central cavity while supporting electric contact with the QCM crystal through the retainer. A transducer external to the reactor chamber and in electric contact with the QCM crystal through a connector in the flange drives the QCM crystal. 수정진동자 미량저울(QCM) 조립체는 ALD 시스템의 반응기 챔버의 뚜껑을 포함한다. QCM 수정진동자는 뚜껑 내에 형성된 중앙 공동의 바닥 섹션 내에 배치된다. QCM 수정진동자의 전면의 중앙 부분은 반응기 챔버의 내부에 노출된다. 중앙 공동 내부의 QCM 수정진동자 위에 배치된 리테이너는 QCM 수정진동자를 뚜껑 내의 렛지에 대해 가압하여 QCM 수정진동자의 전면과 렛지 사이에 밀봉을 형성하고 또한 QCM 수정진동자와 전기 접촉을 형성한다. 플랜지는 리테이너를 통해 QCM 수정진동자와 전기 접촉을 지지하면서 뚜껑의 상부면에 바로 인접하여 위치하여 중앙 공동을 밀봉한다. 플랜지 내의 커넥터를 통해 QCM 수정진동자와 전기 접촉하고 반응기 챔버 외부에 있는 트랜스듀서가 QCM 수정진동자를 구동한다.
Bibliography:Application Number: KR20170028887