WASHING LIQUID AND WASHING METHOD

Provided are a washing liquid which is excellent in erosion resistance against metals including cobalt as a washing liquid used for removing residues or etching residues of photoresist patterns, and a washing method using the same. Hydrofluoric acid (A), a tetrazole compound (B) and water (C) are co...

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Bibliographic Details
Main Authors GOTO TATSUO, SEKI KENJI
Format Patent
LanguageEnglish
Korean
Published 13.09.2017
Subjects
ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES
BASIC ELECTRIC ELEMENTS
CANDLES
CHEMISTRY
DETERGENT COMPOSITIONS
DETERGENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
FATTY ACIDS THEREFROM
METALLURGY
RECOVERY OF GLYCEROL
RESIN SOAPS
SEMICONDUCTOR DEVICES
SOAP OR SOAP-MAKING
USE OF SINGLE SUBSTANCES AS DETERGENTS
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Summary:Provided are a washing liquid which is excellent in erosion resistance against metals including cobalt as a washing liquid used for removing residues or etching residues of photoresist patterns, and a washing method using the same. Hydrofluoric acid (A), a tetrazole compound (B) and water (C) are contained in the washing liquid. As the tetrazole compound (B), a compound represented by the formula (B1) is preferable. In the formula (B1), R^1 is a hydrogen atom or an organic group, and R^2 is a hydrogen atom, a hydroxyl group, a mercapto group, an amino group, or an organic group. (과제) 포토레지스트 패턴의 잔사물이나 에칭 잔사물의 제거 등에 사용되는 세정액으로서, 코발트를 포함하는 금속에 대한 방식성이 우수한 세정액, 및 이것을 사용하는 세정 방법을 제공하는 것. (해결 수단) 세정액에 불화수소산 (A), 테트라졸 화합물 (B) 및 물 (C) 를 함유시킨다. 테트라졸 화합물 (B) 로는, 하기 식 (B1) 로 나타내는 화합물이 바람직하다. 식 (B1) 중, R은, 수소 원자 또는 유기기이고, R는 수소 원자, 수산기, 메르캅토기, 아미노기, 또는 유기기이다. [화학식 1]
Bibliography:Application Number: KR20170026650