Photoresist Composition Comprising Acid Amplifier

• Main Authors: CHOI, HAN YOUNG, YANG, DON SIK
• Format: Patent
• Language: English; Korean
• Published: 30.08.2017
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

The present invention provides: a positive photoresist composition including a potential alkali soluble resin, a photoacid generator and an acid amplifier, and including the photoacid generator and the acid amplifier at a ratio of 1:2 to 1:10; and a negative photoresist composition including an alka...