Photoresist Composition Comprising Acid Amplifier

The present invention provides: a positive photoresist composition including a potential alkali soluble resin, a photoacid generator and an acid amplifier, and including the photoacid generator and the acid amplifier at a ratio of 1:2 to 1:10; and a negative photoresist composition including an alka...

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Bibliographic Details
Main Authors CHOI, HAN YOUNG, YANG, DON SIK
Format Patent
LanguageEnglish
Korean
Published 30.08.2017
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Summary:The present invention provides: a positive photoresist composition including a potential alkali soluble resin, a photoacid generator and an acid amplifier, and including the photoacid generator and the acid amplifier at a ratio of 1:2 to 1:10; and a negative photoresist composition including an alkali soluble resin, a cross-linking agent, a photoacid generator and an acid amplifier, and including the photoacid generator and the acid amplifier at a ratio of 1:2 to 1:10. The photoresist composition according to the present invention can form a clear pattern even in a core portion of a thick film. 본 발명은 잠재성 알칼리가용성 수지, 광산발생제 및 산증폭제를 포함하며, 상기 광산발생제와 상기 산증폭제를 1:2 내지 1:10의 비율로 포함하는 포지티브 포토레지스트 조성물; 및 알칼리가용성 수지, 가교제, 광산발생제 및 산증폭제를 포함하며, 상기 광산발생제와 상기 산증폭제를 1:2 내지 1:10의 비율로 포함하는 네가티브 포토레지스트 조성물을 제공한다. 본 발명에 따른 포토레지스트 조성물은 후막에서도 심부까지 선명한 패턴을 형성할 수 있다.
Bibliography:Application Number: KR20160020682