ETCHING SOLUTION AND PHOTOMASK DEFORMED BY ETCHING SOLUTION

• Main Authors: OHWADA TAKUO, ISHIKAWA NAOKI
• Format: Patent
• Language: English; Korean
• Published: 23.08.2017
• Subjects: ADHESIVES; APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; DYES; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE; MATERIALS THEREFOR; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; ORIGINALS THEREFOR; PAINTS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; POLISHES

Provided is an etching solution capable of precisely controlling light transmittance in semi-transmittance parts on photomask in the production of the photomask for lithography. Moreover, provided are a method for producing a gray scale mask using the etching solution, and a gray scale mask by the m...