PHOTORESIST STRIPPER COMPOSITION

• Main Authors: LEE, SANG DAI, LIM, CHAN KYU, JEONG, HYUN CHEOL, KIM, MIN HEE, LIM, HYUN TAE
• Format: Patent
• Language: English; Korean
• Published: 01.08.2017
• Subjects: ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES; APPARATUS SPECIALLY ADAPTED THEREFOR; CANDLES; CHEMISTRY; CINEMATOGRAPHY; DETERGENT COMPOSITIONS; DETERGENTS; ELECTROGRAPHY; FATTY ACIDS THEREFROM; HOLOGRAPHY; MATERIALS THEREFOR; METALLURGY; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; RECOVERY OF GLYCEROL; RESIN SOAPS; SOAP OR SOAP-MAKING; USE OF SINGLE SUBSTANCES AS DETERGENTS

A stripping liquor composition for removing a photoresist can quickly strip a denatured photoresist after dry-type or wet-type etching without using N-methylformamide (NMF) or N-methylpyrrolidone (NMP) harmful to environment and humans, and has an advantage of significantly increasing the efficiency of processes since foreign matters and stains do not remain on a substrate. In addition, the corrosion of a lower film is also minimized to significantly increase process efficiency. 본 발명의 포토레지스트 제거용 박리액 조성물은 환경과 인체에 유해한 N-메틸포름아미드(N-methylforamide; NMF), N-메틸피롤리돈(N-methylpyrrolidone; NMP)을 주용매로 사용하지 않고도, 건식 또는 습식 에칭 후에도 변성된 포토레지스트를 신속하게 박리시킬 수 있으며, 기판 상에 이물 및 얼룩이 잔류하지 않아 공정상 효율성을 현저히 증가시킬 수 있는 장점이 있다. 또한, 하부막 부식 역시 최소화하여 공정상 효율성을 현저히 증가시킬 수 있는 장점이 있다.