GAS SEPARATION CONTROL IN SPATIAL ATOMIC LAYER DEPOSITION

• Main Authors: GRIFFIN KEVIN, NGO TAI T, MARCUS STEVEN D, LI NING
• Format: Patent
• Language: English; Korean
• Published: 28.07.2017
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

공간적인 원자 층 증착을 위한 장치 및 방법들은 적어도 하나의 제 1 배기 시스템 및 적어도 하나의 제 2 배기 시스템을 포함한다. 각각의 배기 시스템은, 개별적인 배기 시스템과 연관된 프로세싱 영역에서의 압력을 제어하기 위해 압력 게이지 및 스로틀 밸브를 포함한다. Apparatus and methods for spatial atomic layer deposition including at least one first exhaust system and at least one second exhaust system. Each exhaust system including a throttle valve and a pressure gauge to control the pressure in the processing region associated with the individual exhaust system.