APPARATUS

• Main Authors: VAN DER MEULEN FRITS, VERBRUGGE BEATRIJS LOUISE MARIE JOSEPH KATRIEN, BROUNS DERK SERVATIUS GERTRUDA, DINGS JACOBUS MARIA, AZEREDO LIMA JORGE MANUEL, VAN LOO JEROME FRANCOIS SYLVAIN VIRGILE, KERSTENS ROLAND JACOBUS JOHANNES, KRUIZINGA MATTHIAS, BRUIJN MARC, LANSBERGEN ROBERT GABRIEL MARIA, LOOS MICHEL, KRAMER RONALD HARM GUNTHER, MIDDEL GEERT, THEUERZEIT FRANK JOHANNES CHRISTIAAN, DE KLERK ANGELO CESAR PETER, LEENDERS MARTINUS HENDRIKUS ANTONIUS, VAN DEN BOSCH GERRIT, LOOPSTRA ERIK ROELOF, REIJNDERS SILVESTER MATHEUS, VAN LIEVENOOGEN ANNE JOHANNES WILHELMUS, JANSEN MAARTEN MATHIJS MARINUS, JANSSEN PAUL, JANSSEN MAURICE LEONARDUS JOHANNES, DEKKERS JEROEN, KESTERS MARTINUS JOZEF MARIA
• Format: Patent
• Language: English; Korean
• Published: 21.07.2017
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

본 발명은 리소그래피 공정에 사용하기에 적합한 마스크 조립체에 대한 툴링에 관한 것으로, 마스크 조립체는 패터닝 디바이스; 및 마운트로 패터닝 디바이스에 장착되고 펠리클을 지지하도록 구성된 펠리클 프레임을 포함하고; 마운트는 패터닝 디바이스와 펠리클 프레임 사이에 해제가능하게 맞물림가능한 부착을 제공한다. A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.