NOVEL RESINS AND PHOTORESIST COMPOSITIONS COMPRISING SAME

본 발명은 락톤 단위를 포함하는 신규 수지 및 이러한 수지를 포함하는 포토레지스트 조성물을 개시한다. Provided are new resins that comprise lactone units and photoresist compositions that comprise such resins.

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Bibliographic Details
Main Authors XU CHENG BAI, ZAMPINI ANTHONY
Format Patent
LanguageEnglish
Korean
Published 14.06.2017
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:본 발명은 락톤 단위를 포함하는 신규 수지 및 이러한 수지를 포함하는 포토레지스트 조성물을 개시한다. Provided are new resins that comprise lactone units and photoresist compositions that comprise such resins.
Bibliography:Application Number: KR20170068882