THINNER COMPOSITION

The present invention relates to a thinner composition and, more specifically, to a thinner composition comprising: propylene glycol C1-C10 alkyl ether; methyl methoxypropionate; and methyl 2-hydroxy isobutyrate. Accordingly, the thinner composition improves spreadability of photoresist and bottom a...

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Bibliographic Details
Main Authors LEE, KYONG HO, YANG, YUN SUK, CHOI, CHEOL MIN
Format Patent
LanguageEnglish
Korean
Published 04.05.2017
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:The present invention relates to a thinner composition and, more specifically, to a thinner composition comprising: propylene glycol C1-C10 alkyl ether; methyl methoxypropionate; and methyl 2-hydroxy isobutyrate. Accordingly, the thinner composition improves spreadability of photoresist and bottom anti-reflective coating (BARC), can significantly reduce usage, and has excellent solubility and EBR properties with respect to various photoresists, BARCs and underlayers. 본 발명은 신너 조성물에 관한 것으로, 보다 상세하게는 프로필렌 글리콜 C1-C10 알킬 에테르; 메틸 메톡시 프로피오네이트; 및 메틸 2-하이드록시 이소부티레이트를 포함함으로써, 포토레지스트 및 하부반사방지막(BARC)의 도포성을 개선하고 사용량을 현저히 절감시킬 수 있으며, 다양한 포토레지스트, 하부반사방지막(BARC) 및 언더레이어(underlayer)에 대하여 우수한 용해성 및 EBR 특성을 갖는 신너 조성물에 관한 것이다.
Bibliography:Application Number: KR20150147477